Prism: Ellipsometry Curve-Fitting

Executes the inverse curve-fitting problem. Contrasts a Naive 2-Layer regression against a Rigorous 3-Layer regression when analyzing noisy experimental data corrupted by physical surface contamination and hardware polarization leakage.

Regression Settings

Solver Architecture
Select whether the statistical solver expects a pristine air-to-bulk boundary, or accounts for surface films.
Target Material
The exact target the solver is attempting to extract.
Surface Contamination (Hidden from Naive Solver)
Physical thickness of surface contamination film (assuming nfilm = 1.45).
Hardware Metrology Errors
Quality of the polarizing crystal (10−6 = Ideal, 10−2 = Poor).
Azimuthal error in the transmission axis.
Mechanical misalignment of the normal baseline.
Gaussian scatter scale multiplier.
Extracted Index (nglass)
--
True Value: --
Extraction Error (Δn)
--
Deviation from True Index
Extracted Thickness (d)
--
nm
Amplitude Ratio (Ψ) Fit
Phase Difference (Δ) Fit
Ψ Residuals (Diagnostic)
Δ Residuals (Mismatch Flag)

Inverse Regression & Joint Optimization

1. Analytical Formulations & Objective Function

Variable Angle Ellipsometry (VAE) measures the complex reflectance ratio (ρ) between the p-polarized (rp) and s-polarized (rs) components of light. This ratio is parameterized by the amplitude ratio (Ψ) and phase difference (Δ):

ρ = rp / rs = tan Ψ · e

For a 3-layer system (ambient 0, film 1, substrate 2), the total reflection coefficients incorporate the Fresnel interface coefficients (r01, r12) and the film phase thickness (β):

rp = (r01p + r12p · e−2iβ) / (1 + r01p r12p · e−2iβ)

rs = (r01s + r12s · e−2iβ) / (1 + r01s r12s · e−2iβ)

where β = 2π (d / λ) nfilm cos θf. Here, d is the contamination thickness, λ is the wavelength, nfilm is the film index, and θf is the refracted angle within the film.

The 3-Pass Adaptive Grid Search algorithm iteratively evaluates combinations of nglass ∈ [1.50, 1.90] and d ∈ [0, 20] nm to minimize the joint Mean Squared Error (MSE) across N discrete measurement points:

MSE = (1 / 2N) ∑ [ (Ψmeas − Ψfit)2 + (Δmeas − Δfit)2 ]

2. Model Mismatch

In Variable Angle Ellipsometry (VAE), the dominant error is Model Mismatch rather than random noise. If experimental data is generated containing a thin physical contamination layer (e.g., adventitious hydrocarbons or native oxide, modeled here with a static index of nfilm = 1.4500), but the statistical solver is instructed to fit it using an air-to-bulk assumption (a 2-layer model), the solver is constrained. (Note: While all materials exhibit optical dispersion, the spectral variation of the ultra-thin film's index induces a negligible phase shift compared to the bulk substrate, and is thus held constant in this algorithm). The solver will mathematically force a fit by artificially skewing the extracted bulk refractive index (nglass) to absorb the physical discrepancy.

3. Phase (Δ) Residuals

By plotting the regression residuals for both Ψ and Δ, the experimenter can visually diagnose this mismatch. While the Ψ residuals might appear acceptable when a 2-layer model is forced onto 3-layer data, the Δ residuals will exhibit a highly structured systematic error signature exactly at the Brewster angle. This alerts the experimenter that their mathematical model is incomplete. Switching to the Rigorous 3-Layer solver restores the flat residual line and decouples the bulk material properties from the surface chemistry.

4. Hardware Leakage, Geometric Misalignment & Solver Constraints

When adjusting the Extinction Ratio (ε) or Analyzer Misalignment (γ) sliders, the extracted parameters (nglass and d) and the theoretical fit lines remain highly stable, whereas they are highly sensitive to actual surface contamination (d). While hardware leakage increases the amplitude residuals (Ψ), the regression solver remains anchored. This illustrates four key principles:

Result: The solver is mathematically anchored by the immune phase data. To minimize the joint MSE and preserve the fit on the Δ curve, the algorithm must maintain d ≈ 0. It mathematically tolerates increased residuals at the minimum of the Ψ curve to prevent large error penalties in the phase domain. This demonstrates why VAE provides more robust constraints than simple intensity-based extraction, provided the system's geometric alignment (θoff) is strictly calibrated.