LP-FEBIP

LP-FEBID(eposition) is a novel technique for direct-write patterning of high-purity, high-fidelity nanostructures. A focused beam of keV electrons enters the liquid reservoir directly or through a thin membrane (e.g., polyimide, silicon nitride, graphene), interacts with the membrane and the liquid precursor, and forms a solid deposit of the reduced species (Pt, Au, Ag and Cu; Cr, Ni and Pd; AuPt and AuAg; CdS and PbS). In the complementary process, LP-FEBIE(tching), material in contact with the liquid is selectively removed from under the electron beam (Si₃N₄, Cu and Au).